치과 임플란트 표면의 과거, 현재, 그리고 미래
- 제목
- Past, Present and Future of the Dental Implant Topography
- 저자
- 김영택
- 키워드 (영문)
- dental implants; osseointegration; titanium; bone-implant interface; medicine; dentistry; dental implant
- 발행연도
- 2021-03
- 발행기관
- 대한치과의사협회
- 유형
- Article
- 초록
- Osseointegration means the interlocking of bone and implant surface. The surface of dental implants played a key role for osseointegration. Commercially pure titanium implants (CPTi) grade 4 implant shows high corrosion resistance and fatigue strength. Most commercial implants use this Titanium and modify the surface with moderate roughness (1~100μm). Moderately roughness offers most effective bone to implant contact and highest removal torque based on the biological stability.
As in the surface roughness, biofilm can be formed easily, peri-implantitis is a next challenge of the implant surface modification. It has been expected to overcome the biological complication of dental implants with the nano technology. However, nano technology has been studied limitedly in the laboratory.
The implant surface will be developed with the aim of having fast osseointegration, long-term BIC interlocking, and high bacterial resistance.
- 저널명
- 대한치과의사협회지
- 저널정보
- (2021-03). 대한치과의사협회지, Vol.59(4), 226–231
- ISSN
- 0376-4672
- DOI
- 10.22974/jkda.2021.59.4.003
- 공개 및 라이선스
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